Finally , according to the technique of plasma etching , an evolution model describing the spatio - temporal profiles of the micro - trench is established . and that we simulated the effects of collisions and the source parameters on the etching profiles 最后,針對等離子體刻蝕工藝,建立了微結(jié)構(gòu)區(qū)剖面的時空演化模型,并模擬了碰撞效應(yīng)和電源參數(shù)對刻蝕剖面演化的影響。
In the present works , a self - consistent model describing the dynamics of radio - frequency ( rf ) sheath was established . the effects of collisions on the rf sheath dynamics , distributions of ion energy and angle incident on the substrate and the etching profiles were investigated numerically 本文建立了一套自洽的碰撞射頻等離子體鞘層理論模型,系統(tǒng)地研究了碰撞效應(yīng)對等離子體鞘層的物理特性、離子入射到基板上的能量分布和角度分布以及刻蝕剖面的影響。